Polythiophenes, block copolymers made therefrom, and methods of forming the same

ABSTRACT

The present invention relates to polythiophenes, particularly regioregular head-to-tail poly(3-alkylthiophenes) (HT-PATs), block copolymers made therefrom, and their methods of formation. The present invention provides HT-PATs with well-defined, specific end-groups, functionalization of the defined HT-PATs, and incorporation of end group functionalized HT-PATs into block copolymers with structural polymers. The intrinsically conductive diblock and triblock copolymers, formed from the HT-PATs, have excellent conductivity and low polydispersities that are useful in a number of applications. The block copolymers of the present invention have been found to exhibit conductivities that range from a low of 10 −8  S/cm for certain applications to as high as several hundred S/cm or more.

This application is a divisional of U.S. application Ser. No.10/004,782, filed Dec. 4, 2001, issued as U.S. Pat. No. 6,602,974, whichis incorporated by reference in its entirety, and is related tocopending U.S. application Ser. No. 10/417,244, filed Apr. 16, 2003.

The subject application is a division of U.S. patent application Ser.No. 10/004,782 filed Dec. 4, 2001, issued as U.S. Pat. No. 6,602,974,which was the subject of reissue application Ser. No. 11/197,727, nowissued as U.S. Pat. RE40,813. The subject application is related to U.S.patent application Ser. No. 10/417,244, filed Apr. 16, 2003, issued asU.S. Pat. No. 7,098,294. The subject application is also related to U.S.patent application Ser. No. 11/088,341 filed Mar. 24, 2005, now pending.

STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

This invention was made with government support under NSF GrantCHE-0107178. The United States government may have rights in thisinvention.

BACKGROUND OF THE INVENTION

1. Technical Field

The present invention is directed, generally, to polythiophenes, and,more particularly, to head-to-tail coupled regioregular polythiophenes,block copolymers made therefrom, and methods of forming the same.

2. Background

Conducting polymers, such as polythiophenes (PTs), represent a class ofpolymers that are lightweight, highly processable and exhibit relativelyhigh environmental stability, thermal stability, and electricalconductivity. These materials can be synthetically tailored to achievedesired properties such as melting point, electrical conductivity,optical and microwave absorbance and reflectance, andelectroluminescence. Compared to inorganic metals and semiconductors,electrically conductive polymers have been found to be promisingcandidates for numerous applications, ranging from electronic andoptical devices, such as field-effect transistors, sensors,light-emitting diodes (LEDs), rechargeable batteries, smart cards, andnon-linear optical materials, to medical applications, such asartificial muscles.

Due, in part, to the increased demand for employing conducting polymersinto a wide range of electrical and optical equipment, efforts have beenmade to advance the ways in which electrically conducting polymers canbe improved for even greater integration into these applications.Numerous attempts to produce electrically conductive polymers thatexhibit the electronic and optical properties of semiconductors andmetals and the mechanical and processing advantages of typical plasticshave, thus far, yielded little success. These attempts typically employone of two distinct methods—the formation of polymer blends, and thesynthesis of block copolymers.

Techniques that incorporate blends and/or composites of conductingpolymers and conventional polymers include chemical and electrochemicalin situ polymerizations. These methods include mechanically mixing twoor more conducting and conventional polymers to form a polymer blend.Blending methods are relatively simple and cost effective when comparedto methods that produce block copolymers, and can be found in variouspublications, such as, for example, H. L. Wang, L. Toppare, J. E.Fernandez, Macromolecules, 23, 1053 (1990); K. Koga, S. Yamasaki, K.Narimatsu, M. Takayanagi, Polym. J. 1989, 21(9), 733 (1989); SyntheticMetals, 21, 41 (1989); Synthetic Metals, 28, c435 (1989); SyntheticMetals, 37, 145 (1990); Synthetic Metals, 37, 195 (1990);Macromolecules, 25, 3284 (1992); Synthetic Metals, 22, 53 (1987);Macromolecules, 22, 1964 (1989); Polymer, 39, 1992 (1989); and U.S. Pat.Nos. 5,427,855 and 5,391,622.

Although the methods disclosed in these publications are said to providesome advancement in the area of electrically conductive polymers, thesemethods include various processing difficulties. For example, onesignificant difficulty relates to the tendency of the blends to formhighly heterogeneous two-phase systems. The high degree of phaseseparation is a result of the relatively small enthalpy of mixingtypically associated with macromolecular systems that limits the levelof molecular intermixing needed to alter the physical properties of eachof the components of the blends. Accordingly, conducting polymer blendsthat exhibit both high electrical conductivity and good mechanicalproperties are very limited. In addition, conventional blending methodstypically encounter the existence of a sharp threshold, known as“percolation” threshold, which is the lowest concentration of conductingparticles needed to form continuous conducting chains when incorporatedinto another material. The percolation threshold for conductivity of theblends is met at about 16% volume fraction of the conducting polymer.This threshold is described in detail in Synthetic Metals, 22(1), 79,(1987) and the references cited therein. Due, in part, to the“percolation” effect, it is difficult to tailor the moderate electricalconductivity for a variety of uses that include the dissipation ofstatic charge.

The second approach to improve the processability and mechanicalproperties of electrically conductive polymers is through the synthesisof block copolymers. Block copolymers are typically formed from thereaction of conducting polymers and conventional polymers (i.e.structural polymers such as polystyrenes, polyacrylates, polyurethanes,and the like), the product of which exhibits a combination of theproperties of their segment polymers. Accordingly, segment polymers canbe chosen to form copolymer products having attractive mechanicalproperties. Furthermore, the covalent linkage between the polymersegments allows phase separation to be limited at the molecular level,thereby providing a more homogeneous product relative to polymer blends.

Although the advantages of block copolymers over polymer blends havelong been recognized, it has been found that incorporating theconducting polymer segments into block copolymers is difficult.Intrinsic electrically conducting polymers consist of a backbone ofrepeating units with π conjugation that limits their formation byconventional polymerization methods, such as radical polymerization,ionic polymerization or ring opening polymerization. Therefore, methodsto incorporate electrically conducting polymers with other polymers arelimited, and typically include linkage of short conjugated segments byflexible spacers to multi-block polymers. These previously reportedblock copolymers have not shown good electrical properties or nanophaseseparation morphology due to the short π conjugation. Recently, therehave been a number of attempts to synthesize block copolymers thatexhibit a nanophase separation morphology. Synthetic Metals, 41-43, 955(1991); Nature, 369, 387 (1994); Synthetic Metals, 69, 463 (1995);Science, 279, 1903 (1998); Macromolecules, 29, 7396 (1996);Macromolecules, 32, 3034 (1999); J. Am. Chem. Soc., 122, 6855 (2001); J.Am. Chem. Soc., 120, 2798 (1998). However, few of the synthesized blockcopolymers have been found to exhibit good electrical properties, suchas conductivity. Moreover, the processes employed to synthesize thesepolymers include tedious step-by-step organic synthesis to build theblock copolymers, or they lack diversity in the types of copolymersavailable.

The discovery of additional applications and new technologies forconductive block copolymers is subject, in large part, to moleculardesigner's ability to control the structure, properties, and function oftheir chemical synthesis. Those in the art have come to recognize thatstructure plays an important, if not critical role, in determining thephysical properties of conducting polymers. PTs represent a class ofconducting polymers that are thought to have the potential forfurthering the advancement of new and improved applications forconductive block copolymers.

Because of its asymmetrical structure, the polymerization of3-substituted thiophenes produces a mixture of PT structures containingthree possible regiochemical linkages between repeat units. The threeorientations available when two thiophene rings are joined are the 2,2′,2,5′, and 5,5′ couplings. When application as a conducting polymer isdesired, the 2,2′ (or head-to-head) coupling and the 5,5′ (ortail-to-tail) coupling, referred to as regiorandom couplings, areconsidered to be defects in the polymer structure because they cause asterically driven twist of thiophene rings that disrupt conjugation,produce an amorphous structure, and prevent ideal solid state packing,thus diminishing electronic and photonic properties. The steric crowdingof the solubilizing groups in the 3 position leads to loss of planarityand less π overlap. In contrast, the 2,5′ (or head-to-tail (HT) coupled)regioregular PTs can access a low energy planar conformation, leading tohighly conjugated polymers that provide flat, stacking macromolecularstructures that can self-assemble, providing efficient interchain andintrachain conductivity pathways. The electronic and photonic propertiesof the regioregular materials are maximized.

HT-poly-alkylthiopenes (HT-PATs) are conjugated polymers in which thealkylthiophene rings are connected in the head-to-tail fashion. One ofthe inventors of the present invention developed the firstregioselective synthesis of this class of polymer (R. D. McCullough etal., J. Am. Chem. Soc., 113, 4910 (1993), and references cited therein)and a method to synthesize these polymers on a large scale (U.S. Pat.No. 6,166,172), which are incorporated by reference herein in theirentirety. The “defect-free” conjugation in these polymer chains leads tobetter π—π between-chain overlap and give rise to highly ordered,conducting polymer structures in solid state films. This solid statestructural order allows charges to travel freely without being trappedor retarded by defects. Therefore, regioregular HT-PAT films have muchhigher conductivity than their regiorandom analogs. In fact, HT-PATsrepresent one of the classes of polymers with the highest electricalconductivity.

Although the McCullough methods have made important strides in theformation of electrically conductive block copolymers, certaindeficiencies exist in their application and the resultant productsformed therefrom. Most significantly, it has been difficult, if notimpossible, to predict with any degree of certainty the type and amountof specific end groups, such as H/Br, H/H, and Br/Br, that are producedthrough application of these methods. Because the end group formation ofHT-PAT product is random, the reaction typically forms products mainlyhaving amounts of either the H/H or H/Br end groups that range from 35%to 65% by weight, but are typically nearly evenly divided in amountsranging from 45% to 55% by weight. As a result, these methods do notprovide HT-PATs with well-defined, specific end-groups, inhibitingfunctionalization of the defined HT-PATs and incorporation of end groupfunctionalized HT-PATs into block-copolymers with structural polymers,such as polystyrenes, polyacrylates, polyurethanes, and the like.

Accordingly, the need exists for HT-PATs and electrically conductingblock copolymers formed therefrom that exhibit, or can be synthesized toexhibit, characteristics of the electronic and optical properties ofsemiconductors and metals and mechanical properties and processingadvantages of typical plastics, and their methods of manufacture.Furthermore, new methods for preparing HT-PATs and block copolymersformed therefrom are needed that are efficient, economical, provide endgroup control, and produce novel block copolymers containing HT-PATconductive segments that have both high electrical conductivity andexcellent mechanical properties.

SUMMARY OF THE INVENTION

This invention provides HT-PATs and their methods of formation, as wellas block copolymers and their methods of formation from the HT-PATs,having attractive mechanical properties and excellent electricalconductivity. Specifically, this invention provides syntheses of blockcopolymers containing regioregular head-to-tail poly(3-alkylthiophenes)conductive segments.

In one embodiment, a polythiophene polymer is provided having thestructure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, X is a halogen, and n is greater than 1. Thepolythiophene polymer is formed from a polymerization reaction in majoramounts of at least 90% by weight.

In another embodiment, a polythiophene polymer is provided having thestructure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than 1. The polythiophene polymeris formed from a polymerization reaction in major amounts of at least90% by weight.

The present invention provides a method of forming the polymers setforth above. One method includes combining a soluble thiophene monomerwith an amide base and a divalent metal halide, and adding an effectiveamount of a Ni(II) catalyst to initiate a polymerization reaction toform at least 90% by weight of the polymer having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, X is a halogen, and n is greater than 1.

Another method of forming a polymer is set forth herein, and includescombining a soluble thiophene monomer with an amide base and zincchloride at a temperature ranging from −78° C. to −60° C., and adding aneffective amount of a Ni(II) catalyst to initiate a polymerizationreaction.

In another embodiment, the present invention provides a method offorming a polymer that includes combining a soluble thiophene with anorganomagnesium reagent. The organomagnesium reagent has the formulaR′MgX′. R′ is a substituent selected from the group consisting of alkyl,vinyl and phenyl and X′ is a halogen, to form at least 90% by weight ofa polythiophene polymer having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than 1.

The present invention also provides a method of forming a polymer thatincludes combining a soluble thiophene monomer with an amide base and adivalent metal halide, and adding an effective amount of a first Ni(II)catalyst to initiate a polymerization reaction to form at least 90% byweight of an intermediate polymer having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, X is a halogen, and n is greater than 1. Added tothe intermediate polymer is a derivative compound represented by theformula PFG-A-MX′ and a second Ni(II) catalyst to form a protectedthiophene polymer, wherein PFG is a hydroxyl or amine functional group,A is selected from the group consisting of alkyl and aromatic, M isselected from the group consisting of Zn or Mg, and X′ is a halogen. Thethiophene polymer is deprotected in an acid environment to form thedeprotected polymer having one functional end group.

In another embodiment, the present invention provides a method offorming a polymer that includes combining a soluble thiophene monomerwith an amide base and zinc chloride at a temperature ranging from −78°C. to −60° C. and adding an effective amount of a first Ni(II) catalystto initiate a polymerization reaction and form an intermediate polymer.A derivative compound represented by the formula PFG-A-MX′ and a secondNi(II) catalyst is added to the intermediate polymer to form a protectedthiophene polymer, wherein PFG is a hydroxyl or amine functional group,A is selected from the group consisting of alkyl and aromatic, M isselected from the group consisting of Zn or Mg, and X′ is a halogen. Theprotected thiophene polymer is deprotected in an acid environment toform the deprotected polymer having one functional end group.

In another aspect of the present invention, a protected thiophenepolymer is provided having the structure:

wherein PFG is a protected hydroxyl or amine functional group, and A isselected from the group consisting of alkyl and aromatic.

The present invention also provides a deprotected polymer having onefunctional end group having the structure:

wherein R is selected from the group consisting of alkyl, polyether, andaryl; n is greater than 1; A is selected from the group consisting ofalkyl and aromatic; and FG is a functional group selected from the groupconsisting of primary alkyl amine and primary alcohol.

In addition, another aspect of the present invention is a method offorming a poly-(3-substituted) thiophene diol, comprising combining asoluble thiophene with an organomagnesium reagent, wherein theorganomagnesium reagent has the formula R′MgX′ and R′ is a substituentselected from the group consisting of alkyl, vinyl and phenyl and X′ isa halogen, to form at least 90% by weight of a polythiopheneintermediate polymer having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than 1. Aldehyde groups areintroduced to both ends of a chain of the intermediate polymer, andreduced to yield the poly-(3-substituted) thiophene diol.

The present invention also provides a thiopene polymer having aldehydeend groups, the polymer having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than 1.

In yet another embodiment, the present invention provides apoly-(3-substituted) thiophene diol having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than 1.

The present invention also provides a method of forming a diblockcopolymer that includes combining a soluble thiophene monomer with anamide base and zinc chloride at a temperature ranging from −78° C. to−60° C. and adding an effective amount of a first Ni(II) catalyst toinitiate a polymerization reaction and form an intermediate polymer. Aderivative compound represented by the formula PFG-A-MX′ and a secondNi(II) catalyst is added to the intermediate polymer to form a protectedthiophene polymer, wherein PFG is a hydroxyl or amine functional group,A is selected from the group consisting of alkyl and aromatic, M isselected from the group consisting of Zn or Mg, and X is a halogen. Theprotected thiophene polymer is deprotected in an acid environment toform a deprotected polymer having one functional end group. An ATRPinitiator and a base are added to the deprotected polymer to form anATRP macroinitiator. CuBr, at least one ATRP ligand, and at least oneradically polymerizable monomer are added to the ATRP macroinitiator toform the diblock copolymer.

Another method of forming a diblock copolymer is presented herein, andincludes providing a deprotected polymer having one functional end grouphaving the structure:

wherein R is selected from the group consisting of alkyl, polyether, andaryl; n is greater than 1; A is selected from the group consisting ofalkyl and aromatic; and FG is a functional group selected from the groupconsisting of primary alkyl amine and primary alcohol. An ATRP initiatorand a base are added to the deprotected polymer to form an ATRPmacroinitiator. CuBr, at least one ATRP ligand, and at least oneradically polymerizable monomer are added to the ATRP macroinitiator toform the diblock copolymer.

In another embodiment, the present invention provides a method offorming a triblock copolymer, and includes combining a soluble thiophenewith an organomagnesium reagent, wherein the organomagnesium reagent hasthe formula R′MgX′ and R′ is a substituent selected from the groupconsisting of alkyl, vinyl and phenyl and X′ is a halogen, to form atleast 90% by weight of a polythiophene intermediate polymer having thestructure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than 1. Aldehyde groups areintroduced to both ends of a chain of the intermediate polymer, andreduced to yield a poly-(3-substituted) thiophene diol. An ATRPinitiator and a base are added to the diol to form an ATRPmacroinitiator. CuBr, at least one ATRP ligand, and at least oneradically polymerizable monomer are added to the ATRP macroinitiator toform the triblock copolymer.

In another embodiment, the present invention provides a method offorming a triblock copolymer that includes providing apoly-(3-substituted) diol having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than 1. An ATRP initiator and abase are added to the diol to form an ATRP macroinitiator, CuBr, atleast one ATRP ligand, and at least one radically polymerizable monomerare added to the ATRP macroinitiator to form the triblock copolymer.

In yet another aspect of the present invention, a method of forming apolyurethane copolymer is provided that includes combining a solublethiophene with an organomagnesium reagent, wherein the organomagnesiumreagent has the formula R′MgX′ and R′ is a substituent selected from thegroup consisting of alkyl, vinyl and phenyl and X′ is a halogen, to format least 90% by weight of a polythiophene intermediate polymer havingthe structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than 1. Aldehyde groups areintroduced to both ends of a chain of the intermediate polymer, andreduced to yield a poly-(3-substituted) thiophene diol. At least onedihydroxyl functional compound and at least one polyisocyanate are addedto the diol to form the polyurethane copolymer.

In another embodiment of the present invention, a method of forming apolyurethane copolymer is provided that includes providing apoly-(3-substituted) thiophene diol having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than 1. At least one dihydroxylfunctional compound and at least one polyisocyanate are added to thediol to form the polyurethane copolymer.

The present invention also provides intrinsically conductive copolymers,such as diblock, triblock, and polyurethane copolymers, having aconductivity ranging from 10⁻⁸ S/cm to 150 S/cm or more.

The present invention also provides an electrically conductive oroptically sensitive polymeric material formed from any of the methods orcomprising the polymers set forth herein.

BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing summary, as well as the following detailed description ofthe preferred embodiments, will be better understood when read inconjunction with the appended drawings. In the drawings:

FIG. 1 is a MALDI MS analysis that illustrates the incorporation of an—OH functional group on one end of the HT-PHT of the present invention;

FIG. 2 is an NMR analysis that illustrates the incorporation of an —OHfunctional group on one end of the HT-PHT of the present invention;

FIG. 3 is a MALDI MS analysis that illustrates obtaining HT-PHT diol;

FIG. 4 is an AFM analysis that reveals the presence of a nanowirenetwork in the solid film of an HT-PHT-block-PS diblock copolymer of thepresent invention;

FIG. 5 is an AFM analysis that reveals the presence of a nanowirenetwork in the solid film of an HT-PHT-block-PMA diblock copolymer ofthe present invention; and

FIG. 6 is a TEM analysis that reveals the presence of a nanowire networkin the solid film of a HT-PHT-block-PMA diblock copolymer of the presentinvention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

It is to be understood that certain descriptions of the presentinvention have been simplified to illustrate only those elements andlimitations that are relevant to a clear understanding of the presentinvention, while eliminating, for purposes of clarity, other elements.Those of ordinary skill in the art, upon considering the presentdescription of the invention, will recognize that other elements and/orlimitations may be desirable in order to implement the presentinvention. However, because such other elements and/or limitations maybe readily ascertained by one of ordinary skill upon considering thepresent description of the invention, and are not necessary for acomplete understanding of the present invention, a discussion of suchelements and limitations is not provided herein. For example, asdiscussed herein, the materials of the present invention may beincorporated, for example, in electronic and optical devices that areunderstood by those of ordinary skill in the art, and, accordingly, arenot described in detail herein.

Furthermore, compositions of the present invention may be generallydescribed and embodied in forms and applied to end uses that are notspecifically and expressly described herein. For example, one skilled inthe art will appreciate that the present invention may be incorporatedinto electrical and optical devices other than those specificallyidentified herein.

Other than in the operating examples, or unless otherwise expresslyspecified, all of the numerical ranges, amounts, values and percentagessuch as those for amounts of materials, times and temperatures ofreaction, ratios of amounts, and others in the following portion of thespecification may be read as if prefaced by the word “about” even thoughthe term “about” may not expressly appear with the value, amount, orrange. Accordingly, unless indicated to the contrary, the numericalparameters set forth in the following specification and attached claimsare approximations that may vary depending upon the desired propertiessought to be obtained by the present invention. At the very least, andnot as an attempt to limit the application of the doctrine ofequivalents to the scope of the claims, each numerical parameter shouldat least be construed in light of the number of reported significantdigits and by applying ordinary rounding techniques.

Notwithstanding that the numerical ranges and parameters setting forththe broad scope of the invention are approximations, the numericalvalues set forth in the specific examples are reported as precisely aspossible. Any numerical value, however, inherently contains certainerrors necessarily resulting from the standard deviation found in theirrespective testing measurements. Furthermore, when numerical ranges ofvarying scope are set forth herein, it is contemplated that anycombination of these values inclusive of the recited values may be used.

As used herein, the term “blend” refers to a combination of at least oneconducting polymer component with at least one other non-conductivepolymer component, wherein the molecular intermixing of the polymercomponents is insufficient to significantly alter the physicalproperties of the individual components of the blend. As used herein,the term “copolymer” refers to a reaction product of at least twopolymer components whereby the physical properties of each of thecomponents is significantly altered, and the covalent linkage betweenthe polymer segments allows phase separation to be limited at themolecular level to form a more homogeneous product relative to a polymerblend. The phrase “intrinsically conductive”, as used herein, refers toan electrically conductive block copolymer having at least oneconducting segment, such as polythiophene, pyrrole, p-phenylenevinylene,and the like, attached thereto.

The present invention provides HT-PATs with well-defined, specificend-groups, functionalization of the defined HT-PATs, and incorporationof end group functionalized HT-PATs into block copolymers withstructural polymers such as polystyrenes, polyacrylates, polyurethanes,and the like. The HT-PATs, the diblock and triblock copolymers formedtherefrom, and the methods of forming the same provide block copolymershaving excellent conductivity and low polydispersities that are usefulin a number of applications.

The HT-PATs of the present invention and their methods of formation areset forth below in Part A. The block copolymers formed from the HT-PATsand their methods of formation are set forth below in Part B.

A. End Group Functionalization of HT-PATs

The end group functionalization of HT-PATs of the present invention isshown in Schemes 1 and 2. Scheme 1 illustrates the synthesis of awell-defined regioregular HT-PATs with one functional end group, andproceeds as follows:

-   -   wherein R is an alkyl group usually having 1 to 15 carbon atoms,        typically having 4 to 15 carbon atoms, and more typically having        4 to 12 carbon atoms (such as butyl, hexyl, octyl, or dodecyl),        an ether group, or aryl group; X is a halogen such as Cl, Br, or        I; n is greater than 1; A is a spacer component, and when        present, is an alkyl or aromatic group (such as, for example,        pyrrole, benzene or thiophene); M is Zn or Mg; X′ is a halogen,        such as Cl, Br, or I; PFG is a hydroxyl or amine protected        functional group, such as —CH₂CH₂OTHP (i.e.        —CH₂CH₂O(tetrahydropyran)), —CH₂CH₂OTMS (i.e.        —CH₂CH₂O(trimethylsilane)), or        and FG is a primary alkyl amine or primary alcohol functional        group such as carboxylic acid, —CH₂CH₂OH, or —CH₂CH₂CH₂NH₂.

Thiophene compound 1 may be various purified halogenated thiophenemonomers having the attached R group defined above. Any suitablethiophene monomer may be employed depending on the product that isdesired. For example, one suitable thiophene monomer starting materialis 2-bromo-3-hexylthiophene. Compound 1 should be relatively pure togive the highest molecular weight yields. Typically, purity levels areat least 95%, and may be about 99% or more pure. Purified compound 1 maybe formed by methods known by those of ordinary skill in the art.

As set forth below in the examples, compound 1 may be reacted with aboutone equivalent of an amide base, such as lithium diisopropylamide (LDA),followed by transmetallation with at least about one equivalent of zincchloride. The reaction proceeds at cryogenic temperatures of −60° C. orless (i.e. colder), and typically range from −78° C. to −60° C. It hasbeen found that zinc chloride, when reacted with the thiophene startingmaterials at cryogenic temperatures, provides particularly good resultswhen compared to other divalent metal halides, such as magnesiumbromide. Comparative examples are illustrated below in Examples 1 and 8.

A Ni(II) catalyst, such as, for example, 1,3-diphenylphosphinopropanenickel(II) chloride (Ni(dppp) Cl₂) or 1,2-bis(diphenylphosphino)ethanenickel(II) chloride (Ni(dppe)Cl₂), may be added to the reaction inamounts ranging from 0.5 to 10 mol %. The Ni(II) catalyst may be addedeither at the cryogenic reaction temperature at which the LDA and zincchloride is added, and then warmed to room temperature (about 25° C.),or the catalyst may be added during the warming period or after thesolution is warmed to room temperature. The solution may be quenchedwith an excess of suitable solvent, such as methyl alcohol, at roomtemperature to form intermediate PAT polymer 2.

As illustrated in Scheme 1, polymer 2 is a regioregular HT-PAT, and hasmajor amounts of H/Br end groups. The synthesis allows the H/Br endgroups present in the HT-PAT product to be controlled and accuratelycalculated. As set forth below, the H/Br end groups are present asproduct in at least 90% by weight, and typically in amounts of at leastabout 95% by weight . Due to the chemically stable nature of polymer 2,the end groups off one side of polymer 2 is modifiable and can be madefunctional.

Polymer 2 may be made functional by the reaction of a derivativecompound and a Ni(II) catalyst to form protected polymer 3. To polymer 2may be added 1 to 100 equivalents of the derivative compound representedby the expression PFG-A-MX′, as defined above, and 0.5 to 10 mol % ofthe Ni(II) catalyst, such as, for example, 1,3-diphenylphosphinopropanenickel(II) chloride (Ni(dppp) Cl₂) or 1,2-bis(diphenylphosphino)ethanenickel(II) chloride (Ni(dppe)Cl₂). Suitable PFG-A-MX′ thiophenederivatives include, for example, compounds having the structure

The PFG-A-MX′ compound may be formed in any manner known to those ofordinary skill in the art, such as, for example, by the followingreaction:

The reaction to form polymer 3 is carried out for a period of timesufficient to form the protected thiophene polymer 3, typically for atleast about one hour. Reaction temperatures typically range from 40° C.to 60° C.

Deprotection of polymer 3 may be accomplished in an acid environmentwith a suitable anhydrous solvent to form the deprotected monofunctionalHT-PAT polymer 4. Although an excess of any type of acid agent may beadded to create an acid environment suitable to solubilize polymer 3, anexcess of hydrochloric acid and water, for example, may be added with arefluxing anhydrous solvent (dry solvent), such as tetrahydrofuran(THF), to form the non-protected HT-PAT with one functional end group,polymer 4. THF is commercially available from Fisher Scientific,Pittsburgh, Pa. The deprotection reaction is typically conducted at roomtemperature.

Excess of reagents are typically employed to drive the modificationreactions to completion to give greater than 95% yield for all of stepssubsequent to the synthesis of HT-PAT and yield polydispersity indices(PDI) of 1.2 to 1.5, and typically 1.2 to 1.3. Purification of all stepsmay be achieved by precipitation and filtration. Therefore, each step ofthe end group modification may have a high yield of greater than 95%.Scheme 1 shows the approach to monofunctionalization, i.e.,functionalization of only one end of each HT-PAT chain, wherein, forexample, compounds bearing protected functional groups (PFG-A-MX′) reactwith the HT-PATs followed by the deprotection of the functional groupsto give HT-PATs with functional groups such as —OH and —NH₂. Both NMRand matrix-assisted-laser-desorption/ionization mass spectroscopy (MALDIMS), a mass analysis technique developed by Professor Franz Hillenkampand Dr. Michael Karas of the University of Munster, Germany, confirmedthe success of the end group modification. MALDI analysis is disclosedin various publications, such as, for example, Karas, M., Hillenkamp,F., Anal. Chem., 60, 2299 (1988); Hillenkamp, F., Karas, M., Beavis, R.C., Chait, B. T., Anal. Chem., 63, 1193A (1991); Liu, J., Loewe, R. S.,McCullough, R. D., Macromolecules, 32, 5777 (1999), each of which isincorporated by reference herein in its entirety.

For example, a starting material 2-bromo-3-hexylthiophene was treatedwith LDA, followed by transmetallation with ZnCl₂. The2-bromo-3-hexyl-5-chlorozincthiophene was polymerized with Ni(dppp)Cl₂to give HT-poly (3-hexylthiophene) (PHT) in 37% yield. The reaction wasoptimized and the polymer end-groups characterized by MALDI-MS.

The monofunctional product of Scheme 1 is employed as the startingmaterial of Scheme 3, discussed hereinbelow, in the preparation ofconducting diblock copolymers of the present invention.

Scheme 2 illustrates the method of the present invention forfunctionalization at both ends of a thiophene starting material (i.e.difunctionalization) that allows for the synthesis of, for example,polystyrene and polymethylacrylate triblock copolymers and polyurethaneelastomers containing HT-PATs. The method may be illustrated as follows:

-   -   wherein X may be any halogen, such as Br or I, n is greater than        1, and R may be any non-reactive or protected reactive        substituent that is non-reactive with the organomagnesium        Grignard reagent (R′MgX′). R may be an alkyl or an ether group,        but typically is an alkyl or substituted alkyl. The        organomagnesium reagent (R′MgX′) may be any Grignard reagent. X′        may be any halogen, but is typically Br or Cl, and R′ is        typically any alkyl, vinyl, or phenyl group. Examples of        suitable R′ substituents include, without limitation, methyl,        vinyl, —C₃H₇, —C₆H₁₃, C₁₂H₂₅, isopropyl, and tert-butyl groups.

Thiophene polymer 5 may be various purified halogenated thiophenemonomers having the attached R group defined above. Any suitablethiophene monomer may be employed depending on the product that isdesired. Purified, brominated thiophene is one example, but any halogenand any nonreactive substituent that provides solubility may be used.The leaving groups may be any halogens, such as Br, Cl, or I. Bromine ispreferred over iodine as the leaving group in the starting monomerbecause the iodine compound substantially increases the toxicity of thereaction to inhibit the same. Polymer 5 should be relatively pure togive the highest molecular weight yields. Typically, at least 95% of thestarting material should be the thiophene starting material, and may beat least 99% or more pure. The thiophene starting material may include amixture of thiophene monomers having H/H, H/Br, and Br/Br end groups,provided their aggregate amounts meet or exceed the preferred puritylevels set forth herein. Purified compound 5 may be formed by themethods discussed herein.

Polymer 5 may be reacted with at least one equivalent of anorganomagnesium (Grignard) reagent, in refluxing solvent, for asufficient period of time, typically at least one hour, and thenquenched to produce polymer 6.

A Grignard metathesis reaction is employed to dehalogenate the HT-PATs.The Grignard metathesis reactions are well known in the art, an exampleof which is described by L. Boymond, M. Rottlander, G. Cahiez, and P.Knochel, Angew. Chem. Int. Ed., Communications, 37, No. 12, pages1701-1703 (1998), which is incorporated herein by reference in itsentirety. If the R group is reactive with the organomagnesium reagent, aprotective group should be coupled with the R group to prevent the Rgroup from taking part in the synthesis. The use of protective groupswith a reactive R group is well known in the art, as described by Greeneand Greene, “Protective Groups in Organic Synthesis,” John Wiley andSons, New York (1981), which is incorporated herein by reference in itsentirety.

Any refluxing anhydrous solvent (dry solvent) in which polymer 5 issoluble, such as THF, may be employed in the formation of theintermediate polymer 6. Formation of polymer 6 should be performed attemperatures at or below the boiling point of the refluxing solvent, andcan be performed at room temperature (25° C.). For example, when THF isemployed, the reaction should be performed at its boiling pointtemperature (66° C.). Thereafter, the product may be quenched, such aswith excess water or methyl alcohol, to yield a pure HT-PAT having asubstantial majority of H/H end groups. The synthesis allows the H/H endgroups present in the HT-PAT product to be controlled and accuratelycalculated. As set forth below, the H/H end groups are present asproduct (polymer 6) in at least 95% by weight, and typically in amountsof 99% by weight or greater. In some embodiments of the presentinvention, essentially all, 100% by weight, of the product from themetathesis reaction is HT-PATs having H/H end groups.

A Vilsmeier reaction may be used to introduce the aldehyde groups toboth ends of each chain to produce polymer 7, as determined by MALDI-MS.The Vilsmeier reaction is disclosed in various publications, forexample, Vilsmeier, A., Haack, A., Ber., 60, 119 (1927), which isincorporated herein by reference in its entirety. N-methylformanilide ordimethylformamide along with an excess of POCl₃ and a solvent may beemployed in the reaction. Suitable solvents include, for example,toluene, 1,2-dichlorobenzene, xylenes, chlorobenzene,1,2-dichloroethane, dimethylformamide, and chloroform. Thereafter, thesolution may be quenched, and precipitated, and washed to form polymer7. Various processing conditions known to those skilled in the art maybe employed in the Vilsmeier reaction. For example, the Vilsmeierreaction may be employed such that about 0.2 mmol of polymer 6 in about125 ml of dry toluene with about 40 mmol of methylformanilide and about30 mmol of POCl₃ at 75° C. for 24 hours provides acceptable reactionproduct. Quenching with aqueous sodium acetate for 2 hours at roomtemperature, precipitating in methanol, and washing by Soxhletextraction in methanol yields 97% of the polymer 7.

The PAT containing two aldehyde end-groups is verified by NMR and MALDI.The aldehyde end groups are reduced with 1 to 100 equivalents of areducing agent, such as NaBH₄, LiAlH(OEt)₃, LiAlH(Ot-Bu)₃, B₂H₆, sodiumbis(2-methoxyethoxy)aluminum hydride (aka Red-Al or Vitride), or LiAlH₄to yield a PAT terminated by hydroxyl groups (copolymer 8).MALDI-Time-of-Flight (TOF) proves the incorporation of terminal hydroxylgroup to both ends of the polymer chain, and that difunctional HT-PATsare achieved.

B. End Group Functionalization of HT-PATs into Block Copolymers

The incorporation of the end group functionalized HT-PATs into blockcopolymers is shown in Schemes 3, 4, and 5. In Schemes 3 and 4,atom-transfer-radical-polymerization (ATRP) is used to incorporate theHT-PATs with some conventional polymers such as polystyrene andpolyacrylates. ATRP is a well-developed “living” radical polymerizationthat generates well-defined polymers, representative methods of whichare described in Wang, J.-S. and Matyjaszewski, K., J. Am. Chem. Soc.,117, 5614-5615 (1997); Patten, T. E., Xia, J, Abernathy, T., andMatyjaszewski, K., Science, 272, 866-868 (1996); Matyjaszewski, K.,Patten, T. E., and Xia, J., J. Am. Chem. Soc., 119, 674-680 (1997); andMatyjaszewski, K., Gobelt, B., Paik, H.-J., and Horwitz, C. P.,Macromolecules, 34, 430-440 (2001), each of which is incorporated byreference herein in its entirety.

For example, one synthesis of an ATRP macroinitiator may be illustratedas follows:

-   -   wherein R may be an alkyl group, an ether group, or an aryl        group, and n is greater than 1.

The non-protected HT-PAT polymer product 4 of Scheme 1 is employed asthe starting material of Scheme 3, for the preparation of conductingdiblock copolymers of the present invention. As set forth above, thesynthesis of diblock copolymers of HT-PATs can be accomplished by firstpreparing a well-defined PAT with at least 90% by weight, and preferably95% by weight, of its end groups containing one proton end-group and onehalogen end-group, such as Br.

Although polymer 4, described above, is defined as having the structure

in order to more clearly illustrate the mechanism of Scheme 3, Scheme 3will now be illustrated such that polymer 4 is one possible PAT, whereinA is a thiophene group, and FG is —CH₂CH₂OH. The discussion set forthhereinbelow relating to the preparation of diblock copolymers using thisparticular embodiment is intended to be illustrative only, and notintended to limit the scope of the claims. Given the teaching set forthherein, one of ordinary skill in the art will understand that polymer 4may be any thiophene polymer having a terminating alcohol group thereon,and will readily be able to employ numerous other polymers that satisfythe criterion set forth in defining polymer 4, and the reactioncomponents of Scheme 3. The method may be illustrated as follows:

-   -   wherein R, as discussed above, may be an alkyl group usually        having 1 to 15 carbon groups, typically 4 to 15 carbon groups,        and more typically having 4 to 12 carbon groups (such as butyl,        hexyl, octyl, or dodecyl), an ether group, or an aryl group, and        n and m are each greater than 1.

Polymer 4 may be modified by the reaction with about one equivalent ofany ATRP initiator disclosed in the publications by Dr. K. Matyjaszewskidiscussed above, such as 2-bromopropionyl bromide, a mild base,typically an amine such as N(CH₂CH₃)₃, and THF. The reaction istypically conducted at room temperature to generate an ATRPmacroinitiator (e.g. polymer 9). To the polymer initiator 9 may be addedin catalytic amounts of CuBr. Any ATRP ligands, such aspentamethyldiethylenetriamine (PMDTA), and any radical polymerizablemonomers suitable in ATRP, such as styrenes, substituted styrenes, andacrylates, such as methyl acrylate, as disclosed in the publications byDr. K. Matyjaszewski, may be employed in Scheme 3. Reaction temperaturestypically range from 90° C. to 100° C. to form the diblock copolymers(e.g. copolymer 10) of the present invention. The amount of radicalpolymerizable monomer added to the system varies depending on thedesired end product.

As an example, polyhexylthiophene-polystyrene (PHT-PS) andpolyhexylthiophene-polymethylacrylate (PHT-PMA) may be made by ATRPmodifying PHT with 2-bromopropionyl bromide to generate polymer 9 as themacroinitiator, following by reaction with styrene or methyl acrylate asthe monomer, and CuBr/N,N,N′,N′,N″-pentamethyldiethylenetriamine (PMDTA)as the catalyst. ATRP using a PHT macroinitiator 9 (0.1 g, about 0.012mmol) was dissolved in the mixture of freshly distilled toluene andmonomers (1:1 when monomer is styrene; 3:1 when monomer is methylacrylate). To this solution CuBr (0.013 g, 0.125 mmol) and PMDTA (0.027g, 0.125 mmol) were added. After being purged with nitrogen for 15minutes, the solution was placed into the oil bath of 90° C. Copolymerswith different ratios of PHT were obtained by pouring the solution intomethanol after different periods of time. After the precipitation andfiltration, the polymer was dissolved in THF followed by passing throughan Al₂O₃ column to eliminate the catalyst. The percentage of thepolystyrene or polymetharcrylate block is completely controlled by thefeed ratio of the monomers as confirmed by NMR and size-exclusionchromatography. High molecular weights and low polydispersities areproduced by this combination.

The non-protected HT-PAT diol polymer product 8 of Scheme 2 is employedas the starting material of Scheme 4 to form conducting triblockcopolymers. In this manner regioregular HT-PATs can be functionalized onboth α and ω ends, that allow for the synthesis of triblock copolymers,such as polystyrene and polymethylacrylate, and polyurethane elastomerscontaining HT-PAT. The method may be illustrated as follows:

-   -   wherein R, as discussed above, may be an alkyl or an ether        group, but typically is an alkyl or substituted alkyl, and n and        m are each greater than 1.

Polymer 8 may be modified by the reaction with about two equivalents ofany ATRP initiator disclosed in the publications by Dr. K. Matyjaszewskidiscussed above, such as 2-bromopropionyl bromide, a mild base,typically an amine such as N(CH₂CH₃)₃, and THF. The reaction istypically conducted at room temperature to generate an ATRPmacroinitiator (e.g. polymer 11). Any ATRP ligands, such as PMDTA, andany radical polymerizable monomers suitable in ATRP, such as styrenes,substituted styrenes, and acrylates, such as methyl acrylate, asdisclosed in the publications by Dr. K. Matyjaszewski, may be employedin Scheme 4. Reaction temperatures typically range from 90° C. to 100°C. to form the triblock copolymers 12 of the present invention. Theamount of radical polymerizable monomer added to the system variesdepending on the desired end product.

From polymer 11, well-defined triblock copolymers PS-PHT-PS andPMA-PHT-PMA 12 of high molecular weight with low polydispersities byusing ATRP with styrene or methyl acrylate as the monomer. Percentagesof the PS or PMA corresponded to the feed ratio of the monomer.

Moreover, the non-protected HT-PAT polymer product 8 of Scheme 2 isemployed as the starting material of Scheme 5, that illustrates a mannerin which regioregular HT-PATs can be functionalized on both α and ω endsto allow for the synthesis of polyurethane elastomers containing HT-PAT.The method may be illustrated as follows:

-   -   wherein R, as discussed above, may be an alkyl or an ether        group, but typically is an alkyl or substituted alkyl, and n, m,        and q are each greater than 1, and OCN—R′—NCO represents        polyisocyanates, such as tolyl diisocyanate and methylene phenyl        diisocyanate.

Although Scheme 5 is illustrated as a specific reaction mechanism thatincludes specific dihydroxyl functional materials (13, 14), one ofordinary skill in the art will recognize that Scheme 5 provides onepossible reaction mechanism to form conducting polyurethane rubber, andthat numerous other dihydroxy functional materials (13, 14), andpolyisocyanate materials may be employed in Scheme 5 to form variousconducting polyurethane rubbers. Accordingly, Scheme 5 is intended to beillustrative only, and not intended to limit the scope of the claims.

For example, when polymer 8 is hydroxy-functionalizedpoly(3-hexylthiophene), by reacting the α, ω hydroxy-functionalizedpoly(3-hexylthiophene) with toluene diisocyanate, 1,4 butanediol andpolyethylene glycol (PEG, M_(n)=1.5K), polyurethane elastomers (14) mayalso be prepared containing the conducting polymer blocks.

Thin films of PHT-PS and PHT-PA (i.e. products of Scheme 3), PS-PHT-PSand PA-PHT-PA (i.e. products of Scheme 4), and polyurethane elastomers(i.e. the product of Scheme 5), were generated by the slow evaporationof toluene solutions to give magenta to purple films with excellentmechanical properties. These films were oxidized by exposure to I₂ vaporto give multifunctional polymers with high electrical conductivities(Table 1) as determined by four-point probe conductivity measurements.

TABLE 1 Conductivity of block copolymers containing HT-PHT PS-PHTDiblock Copolymers wt % of HT-PHT^(a) 100% 37% 22% 14% Average M_(n)^(b) 16,800 30,200 41,400 53,400 M_(w)/M_(n) ^(b) 1.28 1.31 1.32 1.45Conductivity (S/cm) 110 4.7 0.08 0.14 PS-PHT-PS Triblock Copolymers wt %of HT-PHT^(a) 100% 52% 26% 7.7% Average M_(n) ^(b) 17,900 25,500 38,10093,600 M_(w)/M_(n) ^(b) 1.23 1.21 1.25 1.51 Conductivity (S/cm) 96 5.30.43 0.05 PA-PHT-PA Triblock Copolymers wt % of HT-PHT^(a) 100% 45% 18%10% Average M_(n) ^(b) 17,900 29,700 50,400 72,300 M_(w)/M_(n) ^(b) 1.231.29 1.41 1.66 Conductivity (S/cm) 96 3.3 1.6 0.076 Polyurethane wt % ofHT-PHT 10% 6.40% 0.60% Conductivity (S/cm) 0.13 0.48 4.6 × 10⁻⁵^(a)represents those results determined by ¹HNMR, and ^(b)representsthose results determined by GPC with polystyrene as the standard

It has been found that certain embodiments of the present inventionexhibit high electrical conductivities. While many copolymers containingconjugated polymers and other polymers and blends have been prepared, itis believed that the excellent conductivity values exhibited by thecopolymers of the present invention, as illustrated in Table 1, have notbeen reported. While 100% HT-PHT has a conductivity of 110 S/cm, PHT-PS(Scheme 3) has a conductivity of about 5 S/cm for a block copolymercontaining 37% HT-PHT. The conductivity drops down to 0.1 S/cm forsamples containing approximately 22% of HT-PHT or less. The conductivityof the block copolymers largely depends on the ratio of the conductingblocks and the non-conducting blocks, which relates to the structuralassembly. The PS-PHT-PS triblock copolymers (Scheme 4) haveconductivities as high as 5 S/cm for a sample with 52% PHT. Theconducting polymer polyurethane copolymers (Scheme 5) exhibitconductivities of as high as 10⁻¹ S/cm, which is much higher than otherpolyurethane conjugative copolymers or blends reported in literature(10⁻⁴ S/cm). Conductivities for blends of conjugative polymers withpolyvinylchloride and other conventional polymers have also been foundto exhibit low conductivities of about 10⁻⁴ S/cm range.

Block copolymers of the present invention, as illustrated in Schemes 3to 5, are intrinsically conductive block copolymers (i.e. are blockcopolymers having a conducting segment, such as polythiophene, pyrrole,p-phenylenevinylene, and the like, attached thereto), such as diblockand triblock copolymers (Schemes 3 and 4, respectively) and polyurethanecopolymers (Scheme 5). As described in detail herein, theseintrinsically conductive block copolymers have been found to exhibitconductivities that range from a low of 10⁻⁸ S/cm for certainapplications to as high as several hundred S/cm or more, but typicallyrange from 10⁻² S/cm to 150 S/cm. Particular embodiments of the presentinvention display conductivities ranging from 1 S/cm to 150 S/cm, 5 S/cmto 150 S/cm, and 10 S/cm to 150 S/cm. The block copolymers of thepresent invention also have excellent film forming and good mechanicalproperties including elasticity in the polyurethane samples when theweight percentage of HT-PHT is moderate to low.

It has been found that in thin and ultra-thin films prepared by castingfrom toluene followed by free evaporation of a solvent, block copolymersof the present invention containing 20-30% of polythiopheneself-assembled into very well-defined nanowires spaced laterally by30-40 nm (which corresponds well to a fully extended HT-PHT block) andreaching the lengths of the order of micrometers. As an example, an AFMmicrograph of a PS-PHT sample is shown where the weight percentage ofPHT is 37%, film cast from 0.5 mg/ml solution in toluene. The thin filmsamples were then imaged using variable-tapping force techniquedeveloped in recent years in the Kowalewski laboratory, and reported inYu, M.-F., Kowalewski, T., Ruoff, R. S., Phys. Rev. Lett., 85, 1456(2000), which is incorporated by reference herein in its entirety, withthe purpose of using tapping mode AFM to study mechanical properties ofmaterials at the nanoscale. It has been found that nanowires wereclearly discernible only under “hard tapping” conditions (tens tohundreds nanonewtons) and were barely identifiable when imaged withforces of the order of just few nanonewtons. Formation of distinctnanoscale morphologies is a common phenomenon in block (or segmented)copolymers consisting of immiscible segments. It is driven by thetendency of different blocks to form phase-separated domains. The sizeand shape of these domains is dictated by the length of the blocks andfor typical molecular weights it is in the range from few to few tens ofnanometers. The formation of nanowire structure is dictated by theimmiscibility of polystyrene and poly (3-hexyl thiophene). Under suchcircumstances nanowires can be predicted to have a core-shellarchitecture, with the minority component (polythiophene) constitutingthe core. Such sheathed structure is consistent with variable-forceexperiments. Under “light tapping” conditions, the tip-sample force isnot high enough to penetrate through the outer sheath of nanowires.Since the polystyrene segments in the sheath can mix with the chainsfrom adjacent aggregates, the boundaries between nanowires are not wellresolved. In contrast, under “hard tapping” conditions, the probe—sampleforce is high enough to deform the outer sheath and “sense” the presenceof a rigid core.

Due to the nanophase separation of block copolymers, the HT-PAT blockscopolymers of the present invention tend to self-assemble into nanoscaledomains. In these worm-like domains HT-PAT chains are fully extended andtightly packed together. These highly ordered π-π stacking structuresmake the domains highly conductive nanowires. TEM, AFM and X-raydiffraction have confirmed the presence of the nanowire network in thesecopolymers. Because of the presence of a nanowire network, the blockcopolymers of the present invention have much higher electricalconductivity than any other conducting blends/composites or copolymerspreviously reported. In addition, the block copolymers synthesized bythis method can form highly smooth coatings when cast from solution.Films of these block copolymers have much better adhesion to substratessuch as glass, steel and plastics than HT-PATs. Upon doping theirmorphology remains uniform, and the films do not crack.

It has been found that novel nanowires morphologies in block copolymersof regioregular poly(alkylthiophenes) of the present invention providethe possibility of guiding the intrinsic self-assembly of sufficientlyregular conjugated polymer chains by coupling them chemically toincompatible segments. In the simplest case, the obtained structure isthe result of interplay between different driving forces ofself-assembly (π-stacking vs. phase separation). Accordingly, due tostrong π-interactions, the free energy landscape of rigid conjugatedmolecules has few deep local minima, which cannot be easily exploredunder normal conditions. Thus the molecules are easily trapped in thestates with high extent of local stacking but at the same time with highconcentration of defects adversely affecting the bulk properties.Copolymerization with incompatible flexible segments may result incompeting driving forces of self-assembly resulting in relatively easierto explore free energy landscapes. Identifying the overall features ofthose energy landscapes may provide the ability to exercise control ofthe resulting nanostructures, and effectively provide ways to applyconjugated polymers as building blocks for future nanoscale- andmolecular level electronic devices.

The block copolymers in their undoped state may be used as field-effecttransistor materials due to the presence of highly ordered nanowirenetwork structures. Friend et al. have reported the using of HT-PATs asfield-effect transistor materials (Burroughes, J. H., Bradley, D. D. C.,Brown, A. R., Marks, R. N., Mackay, K., Friend, R. H., Burns, P. L.,Holmes, A. R., Nature (London), 347, 539 (1990); Bao, Z., Dodabalapur,A., Lovinger, A. J., Appl. Phys. Lett., 69, 4108 (1996)). Thefield-effect mobilities of the block copolymers described here can be ashigh as 0.1 cm²V⁻¹s⁻¹. Additionally, the block copolymers in theirundoped state can be used as dielectric materials.

These block copolymers may also be used in their undoped state forapplications in which the conductivity requirements are not too high(10⁻⁸ to 10⁻² S/cm), such as static dissipation.

Doping of the block copolymers with oxidizing agents increases theconductivity to as high as several hundred S/cm. Oxidizing dopantsinclude, but are not limited to, iodine, ferric chloride, goldtrichloride, antimony chloride, nitrosonium tetrafloroborate. The dopingcan be carried out both in solution and in the solid state. Doping canalso be achieved electrochemically by confining the block copolymers toan electrode surface and subjecting it to an oxidizing potential in anelectrochemical cell. Block copolymers in the doped state may be usedfor such applications as magnetic/electrical field shielding materials(electronics package materials) and microwave absorption materials.

The present invention will be described further by reference to thefollowing examples. The following examples are merely illustrative ofthe invention and are not intended to be limiting. Unless otherwiseindicated, all parts are by weight.

EXAMPLES Example 1

This example illustrates the preparation of regioregular head-to-tailpoly(3-hexylthiophene) having H/Br end groups (polymer 2 in Scheme 1).

In 50 ml of dry THF was placed 1.4 ml of distilled diisopropyl amine (10mmol) and 3.7 ml of 2.58 M n-BuLi (9.5 mmol) at −78° C. and then themixture was warmed to room temperature (25° C.) for 5 minutes and thencooled to −78° C. The monomer 2-bromo-3-hexylthiophene (2.5 g, 10 mmol)was added to the freshly generated LDA and the reaction stirred at −70°C. for 1 hour. Then anhydrous ZnCl₂ (1.43 g, 10.5 mmol) was added at−70° C. and the reaction was stirred for 1 hour. The reaction was warmedto 0° C. and 35 mg of Ni(dppp)Cl₂ (0.065 mmol, 0.6 mol %) was added. Themixture was warmed to room temperature and then stirred an additional 30minutes. The polymer was precipitated from methanol. The polymer waswashed/fractionated by Soxhlet extraction with methanol, hexane,ethylene chloride and THF. The THF fraction was characterized and used.¹HNMR (CDCl₃) 6.98 (s, 1H), 2.79 (t, J=7.68 Hz, 2H), 1.62 (m, 2H), 1.48(m, 2H), 1.36 (m, 4H), 0.90 (t, J=6.33 Hz, 3H); MALDI MS M_(n)=7634,PDI=1.14, end-group % s: H/Br: about 95%, H/H: about 4%, Br/Br: about 1%; GPC M_(n)=16,800, PDI=1.28.

Example 2

This example illustrates the preparation of regioregular head-to-tailpoly(3-hexylthiophene) with one —OH functional end group.

The preparation was performed as illustrated in Scheme 1. The first stepof the preparation was to synthesize HT-PHT with a bromine end group(H/Br). The polymer was prepared in a manner similar to the methodpreviously published in R. D. McCullough et al., J. Am. Chem. Soc., 113,4910 (1993), except that anhydrous ZnCl₂ was used instead of MgBr₂.EtO,and the reaction proceeded at cryogenic temperatures of −78° C. In orderto obtain high purity of end group composition of H/Br, strict controlof the polymerization conditions was employed. The monomer should berelatively pure, and is typically 99% or more pure. Trace amounts of3-hexylthiophene in the monomer were found to contribute significantlyto the production of H/H chains. It was found that the amount of LDAemployed should be controlled, and that, typically, LDA should be addedin amounts of at least about one equivalent of the monomer.

The HT-PHT with well-defined H/Br end group structure was then used toperform the end group modification. To a 100 ml flask were added 20 mlanhydrous THF and 0.708 g of 2-(2-thienylethoxy)tetrahydro-2H-pyran(0.0025 mol). The flask was cooled to −40° C. and 1 ml of butyllithiumsolution (2.5M) was added. The solution was kept at −40° C. for 30minutes, followed by the addition of 0.8 g of anhydrous ZnCl₂. Thesolution was then slowly warmed up to room temperature. This organozincsolution was transferred to a THF (30 ml) solution with 0.29 of HT-PHTwith HBr end group. After the addition of 0.08 g of Ni(dppp)Cl₂, thesolution was kept stirring at 60° C. for 5 hours. The polymer was thenprecipitated out in methanol and purified by reprecipitation. Thispolymer was deprotected with HCl/THF mixture at 40° C. for 3 hours andthen precipitated in methanol. After filtration and drying, HT-PHT with—OH functional group was obtained with a yield of 95%. FIG. 1 and FIG. 2show respectively the NMR and MALDI of this hydroxy functionalizedhead-to-tail poly(3-hexylthiophene).

Example 3

This example illustrates the preparation of regioregular head-to-tailpoly(3-hexylthiophene) diol.

The synthesis was carried out as illustrated in Scheme 2. HT-PHT (0.3 g,0.04 mmol) was dissolved in anhydrous THF (80 ml). 2M t-butylMgCl in THF(5 ml) was then added. The mixture was warmed to 70° C. and stirred atthat temperature for 2 hours. After cooling to room temperature, 2M HClaqueous solution (5 ml) was added to neutralize the solution. Afterprecipitated in methanol and purified by Soxhlet extraction, the polymerwas dissolved in anhydrous toluene (80 ml) under nitrogen.N-methylformanilide (2 ml, 0.016 mol) and POCl₃ (1.3m1, 0.014 mol) werethen added. The reaction was carried out at 75° C. for 24 hours. Thesolution was cooled to room temperature, followed by adding saturatedaqueous solution of sodium acetate. The solution was stirred for another2 hours. The polymer was precipitated in methanol and purified bySoxhlet extraction with methanol. After drying in vacuum, the polymerwas dissolved in anhydrous THF (80 ml) under nitrogen. LiAlH₄ solutionin THF (1M, 1.0 ml) was then added. The mixture was stirred at roomtemperature for 40 minutes. HCl (1 M, 1 ml) was then added to quench theexcess LiAlH₄. The polymer was precipitated in methanol and purified bySoxhlet extraction with methanol. After drying in vacuum, HT-PHT diolwas obtained. Yield was recorded to be 93%. FIG. 3 is the MALDI MS ofthe product.

Example 4

This example illustrates the preparation and properties ofHT-PHT-block-polystyrene diblock copolymers.

The preparation was performed as shown in Scheme 3. —OH functionalizedHT-PHT (0.14 g, 0.018 mmol) was dissolved in anhydrous THF (40 ml) undernitrogen. To the solution triethylamine (3.0 ml, 0.022 mol) and2-bromopropionyl bromide (2.5 ml, 0.02 mol) were added. The reaction wascarried out at room temperature for about 12 hours. The polymer wasprecipitated in methanol and purified through dissolving in THF andprecipitation again in methanol. After drying in vacuum, thismacroinitiator (0.1 g, about 0.012 mmol) was dissolved in the mixture ofstyrene (7 ml) and toluene (7 ml). The styrene has been freshlydistilled under vacuum to eliminate the inhibitor. The toluene was alsofreshly distilled. To this polymer solution CuBr (0.036 g, 0.25 mmol)and N,N,N′N′N″-pentamethyldiethylenetriamine (PMDTA) (0.043 g, 0.25mmol) were added. The solution was then purged with nitrogen for 20minutes and placed into an oil bath of 90° C. 5 ml of the solution wasremoved by syringe to precipitate the polymer in methanol after 0.5hours, 1.5 hours, 3.0 hours, and 4.5 hours respectively. The diblockcopolymers were dissolved in THF and passed through the Al₂O₃ column toeliminate the catalyst. Pure copolymers were obtained afterprecipitation in methanol again. All four copolymers were a purplepowder.

The molecular weights of these copolymers have been measured by NMR andsize exclusion chromatography equipped with an UV detector. Both toolshave confirmed the success of the preparation of the block copolymers.The characterization results are listed in Table 2.

TABLE 2 Characterization Data of the Compositions, Molecular Weights,Molecular Weight Distributions and Electrical Conductivity ofHT-PHT-Block-PS Diblock Copolymers Mn Mn Mw/ Conductivity Sample n M(¹HNMR) (SEC) Mn (S/cm) (PHT_(n)-b-PS_(m)) 1 50 50 14,000 16,100 1.15138 (PHT_(n)-b-PS_(m)) 2 51 136 22,900 30,200 1.31 4.7(PHT_(n)-b-PS_(m)) 3 51 279 37,600 41,400 1.32 0.08 (PHT_(n)-b-PS_(m)) 451 425 52,900 53,400 1.45 0.14

The solid films of these diblock copolymers were prepared throughcasting from their solutions in toluene. Atomic Force Microscopy (AFM)was employed to characterize their morphology. All of them showed long“nano-wire” network structures. FIG. 4 shows an example of these AFMimages.

The electrical conductivities of these diblock copolymers were measuredusing the routine four-point probe method. The block copolymer solutionsin toluene (5 mg/1 ml) were cast on glass slides. These solid films werethen exposed to an iodine atmosphere for 10 hours. Thereafter, thefour-point probe method was used to measure the resistance of the films.At least 6 times of repeating measurement were carried for a selectedarea. Each of the glass slides with polymer films was then dipped intoliquid nitrogen and broken into two pieces at the selected area. Becausethe temperature was much lower than the T_(g) of the copolymers, thebreaking cross sections were clean and flat. Scanning ElectronMicroscopy (SEM) was then employed to measure the width of the crosssections of the selected areas. The conductivity (σ) was obtained withthe following:σ=1/ρ=1/(4.53*R*W)in which R represents the resistance and W is the width of a solid film.The measurement results are listed in Table 2.

Example 5

This example illustrates the preparation and properties ofHT-PHT-block-polymethylacrylate (PMA) diblock copolymers.

The synthesis is the same as that described in Example 4 except thatmethyl acrylate monomer was used in the ATRP step. NMR and sizeexclusion chromatography also were used to characterize these diblockcopolymers. The characterization results are listed in Table 3.

TABLE 3 Characterization Data of the Compositions, Molecular Weights,Molecular Weight Distributions and Electrical Conductivity ofHT-PHT-Block-PMA Diblock Copolymers Mn Mn Mw/ Conductivity Sample n M(¹HNMR) (SEC) Mn (S/cm) (PHT_(n)-b-PMA_(m)) 42 25 9,300 16,100 1.15 1161 (PHT_(n)-b-PMA_(m)) 42 42 10,800 17,800 1.15 49 2 (PHT_(n)-b-PMA_(m))42 117 17,300 23,900 1.19 7.1 3

Both AFM and TEM have confirmed the presence of “nano-wire” networks inthe solid films of the diblock copolymers casted from their solution intoluene or xylene. FIG. 5 and FIG. 6 respectively show the AFM and TEMof a HT-PHT-block-PMA sample.

The conductivity measurement of these diblock copolymers was performedin the same way as described in Example 3. The results are also listedin Table 3.

Example 6

This example illustrates the preparation and properties ofPS-block-HT-PHT-block-PS and PMA-block-HT-PHT-block-PMA triblockcopolymers.

The preparation was carried out as illustrated in Scheme 4. Adifunctional ATRP macroinitiator was synthesized. HT-PHT diol wasdissolved in anhydrous THF under nitrogen. To this solutiontriethylamine and 2-bromopropionyl bromide were added. After thereaction was carried out at room temperature for about 12 hours, thepolymer was precipitated in methanol. The polymer was purified throughdissolving in THF and precipitation again in methanol. After drying invacuum, the polymer was used as difunctional initiator to perform theATRP polymerization of styrene and methyl acrylate. The ATRP procedurewas the same as that described in Example 4.

The characterization results of these triblock copolymers are listed inTable 4.

TABLE 4 Characterization Data of the Compositions, Molecular Weights,Molecular Weight Distributions and Electrical Conductivity of TriblockCopolymers Containing Regioregular Head-to-Tail Polyhexylthiophene(PHT). Mn Mn Mw/ Conductivity Sample n M (¹HNMR) (SEC) Mn (S/cm)(PS_(m/2)-b-PHT_(n)-b- 56 86 18,500 25,500 1.21 5.2 PS_(m/2)) 1(PS_(m/2)-b-PHT_(b)-b- 56 251 35,600 38,100 1.25 0.43 PS_(m/2)) 2(PS_(m/2)-b-PHT_(n)-b- 56 822 94,900 93,600 1.51 0.05 PS_(m/2)) 3(PMA_(m/2)-b-PHT_(n)- 56 122 20,100 29,700 1.29 3.3 b-PMA_(m/2)) 1(PMA_(m/2)-b-PHT_(n)- 59 352 46,100 50,400 1.41 1.6 b-PMA_(m/2)) 2(PMA_(m/2)-b-PHT_(n)- 56 625 74,500 72,300 1.66 0.076 b-PMA_(m/2)) 3

Example 7

This example illustrates the preparation and properties of polyurethanecontaining HT-PHT.

Chemical incorporation of HT-PHT into polyurethane was performed asshown in Scheme 5. A two-shot process was used to carry out thesynthesis. The stoichiometric amounts of HT-PHT diol prepared asdescribed in Example 3 was dissolved in anhydrous THF in a flaskequipped with a mechanical stirrer, reflux condenser and a droppingfunnel. A few drops of dibutyltin dilaurate were added as catalyst. Atreflux temperature, tolyl diisocyanate (TDI) was added dropwise withconstant stirring and the reaction was continued for 2 hours to ensureendcapping of the polyhexylthiophene-diol by the TDI. The requiredquantity of 1,4-butanediol and PEG in THF was then added over a periodof half an hour. The reaction was continued for 3 hours and the excessTHF was distilled off. The viscous polymer solution was then cast andcured at room temperature in dry atmosphere.

Three polyurethane samples with different percentages of HT-PHT weresynthesized. The weight percentage of HT-PHT in these three samples are10%, 6.4%, and 0.6% respectively. After doped with iodine, thefour-point probe method was employed to measure the conductivities ofthese polyurethane films. The results are listed in Table 5.

TABLE 5 Conductivities of Polyurethane Samples Containing HT-PHT wt % ofHT-PHT 10% 6.40% 0.60% Conductivity (s/cm) 0.13 0.48 4.6 × 10⁻⁵

Example 8

The following example is a procedure comparison for the polymerizationof regioregular HT-PAT using ZnCl₂ (set forth in Example 1) versusMgBr₂.

An anhydrous diisopropylamine (1.4 ml, 10 mmol) and anhydrous THF (50ml) were placed in a 100 ml flask. This mixture was cooled to atemperature of −76° C., and 4 ml of 2.5M Butyllithium was added. Thesolution was warmed to 0° C., stirred at that temperature for 5 minutesand cooled back to a temperature of −76° C. To this reaction mixturecontaining LDA was added 2-bromo-3-hexylthiophene (2.47 g, 10 mmol) andthe solution was stirred at −50° C. for 1 hour. This was followed byaddition of anhydrous MgBr₂.Et₂O (2.6 g, 10 mmol) at −60° C. and thereaction was stirred at that temperature for 1 hour. The reaction wasthen slowly allowed to warm up to 0° C., whereupon all MgBr₂.Et₂O hadreacted. To the above mixture 35 mg of Ni(dppp)Cl₂ was added and themixture was stirred at room temperature for 1 hour. The polymer was thenprecipitated with methanol. After filtration, the polymer was purifiedby Soxhlet extraction with methanol, hexane, CH₂Cl₂ and finally THF.0.32 g of polymer was obtained from the THF fraction after removing theTHF (yield is 37%). MALDI analysis, H/Br: about 75%, H/H: about 20%,Br/Br: about 5%.

The regioregular polymers, and the methods of forming the same providethe diblock and triblock copolymers having excellent conductivity andlow polydispersities that are useful in a number of commerciallyimportant applications. Examples include light emitting diodes (LEDs),polymer sensors, biosensors, field-effect transistors, flat paneldisplays, televisions, roll up displays, smart cards, phone cards,chemical sensory materials, and nonlinear optical materials. Moreover,phase separation of block copolymers can produce micro- or nanoscalesheets, cylinder or spheres that could be used to fabricate micro- ornanoscale electronic and optical devices, such as nanoscale transistors.

Although the foregoing description has necessarily presented a limitednumber of embodiments of the invention, those of ordinary skill in therelevant art will appreciate that various changes in the components,details, materials, and process parameters of the examples that havebeen herein described and illustrated in order to explain the nature ofthe invention may be made by those skilled in the art, and all suchmodifications will remain within the principle and scope of theinvention as expressed herein in the appended claims. It will also beappreciated by those skilled in the art that changes could be made tothe embodiments described above without departing from the broadinventive concept thereof. It is understood, therefore, that thisinvention is not limited to the particular embodiments disclosed, but itis intended to cover modifications that are within the principle andscope of the invention, as defined by the appended claims.

1. An intrinsically conductive copolymer, the copolymer having aconductivity ranging from 10⁻⁸ S/cm to 300 S/cm, wherein the copolymeris a polyurethane copolymer.
 2. An intrinsically conductive copolymer,the copolymer, having a conductivity ranging from 10⁻⁸ S/cm to 300 S/cm,wherein the copolymer includes a structural polymer comprising anATRP(atom-transfer-radical-polymerization)-polymerizable segment.
 3. Anintrinsically conductive copolymer, the copolymer having a conductivityranging from 10⁻⁸ S/cm to 300 S/cm, wherein the copolymer has at leastone intrinsically conducting polymer segment, the copolymer including astructural polymer comprising anATRP(atom-transfer-radical-polymerization)-polymerizable segment.
 4. Thecopolymer of claim 3, wherein the copolymer has at least one conductingsegment selected from the group consisting of polythiophene,polypyrrole, poly-ρ-phenylenevinylene, and polyaniline, the copolymerincluding a structural polymer selected from the group consisting of apolystyrene, a polyacrylate, and a polyurethane.
 5. The copolymer ofclaim 3, wherein the conductivity ranges from 10⁻⁸ S/cm to 150 S/cm. 6.The copolymer of claim 3, wherein the conductivity ranges from 10⁻⁵ S/cmto 300 S/cm.
 7. The copolymer of claim 3, wherein the conductivityranges from 10⁻⁵ S/cm to 150 S/cm.
 8. The copolymer of claim 3, whereinthe conductivity ranges from 10⁻² S/cm to 150 S/cm.
 9. The copolymer ofclaim 3, wherein the conductivity ranges from 1 S/cm to 150 S/cm. 10.The copolymer of claim 3, wherein the conductivity ranges from 5 S/cm to150 S/cm.
 11. The copolymer of claim 3, wherein the conductivity rangesfrom 10 S/cm to 150 S/cm.
 12. The copolymer of claim 3, wherein thecopolymer is a diblock copolymer.
 13. The copolymer of claim 3, whereinthe copolymer is a triblock copolymer.
 14. The copolymer of claim 3,wherein the copolymer is a polyurethane copolymer.
 15. An intrinsicallyconductive polythiophene copolymer, the copolymer having a conductivityranging from 10⁻⁸ S/cm to 300 S/cm, wherein the copolymer is formed fromthe polymer having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, X is a halogen, and n is greater than 1, thepolymer being formed from a polymerization reaction in major amounts ofat least 90% about 75% by weight.
 16. The copolymer of claim 15, whereinthe conductivity ranges from 10⁻⁸ S/cm to 150 S/cm.
 17. The copolymer ofclaim 15, wherein the conductivity ranges from 10⁻⁵ S/cm to 300 S/cm.18. The copolymer of claim 15, wherein the conductivity ranges from 10⁻⁵S/cm to 150 S/cm.
 19. The copolymer of claim 15, wherein theconductivity ranges from 10⁻² S/cm to 150 S/cm.
 20. The copolymer ofclaim 15, wherein the conductivity ranges from 1 S/cm to 150 S/cm. 21.The copolymer of claim 15, wherein the conductivity ranges from 5 S/cmto 150 S/cm.
 22. The copolymer of claim 15, wherein the conductivityranges from 10 S/cm to 150 S/cm.
 23. An intrinsically conductivepolythiophene copolymer, the copolymer having a conductivity rangingfrom 10⁻⁸ S/cm to 300 S/cm, wherein the copolymer is formed from theprotected thiophene polymer having the structure:

wherein PFG is a protected hydroxyl or amine functional group, and A isselected from the group consisting of alkyl and aromatic, the protectedthiophene polymer formed from a polythiophene polymer, the polymerhaving the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, X is a halogen, and n is greater than 1, thepolymer being formed from a polymerization reaction in major amounts ofat least 90% about 75% by weight.
 24. The copolymer of claim 23, whereinthe conductivity ranges from 10⁻⁸ S/cm to 150 S/cm.
 25. The copolymer ofclaim 23, wherein the conductivity ranges from 10⁻⁵ S/cm to 300 S/cm.26. The copolymer of claim 23, wherein the conductivity ranges from 10⁻⁵S/cm to 150 S/cm.
 27. The copolymer of claim 23, wherein theconductivity ranges from 10⁻² S/cm to 150 S/cm.
 28. The copolymer ofclaim 23, wherein the conductivity ranges from 1 S/cm to 150 S/cm. 29.The copolymer of claim 23, wherein the conductivity ranges from 5 S/cmto 150 S/cm.
 30. The copolymer of claim 23, wherein the conductivityranges from 10 S/cm to 150 S/cm.
 31. An intrinsically conductivepolythiophene copolymer, the copolymer having a conductivity rangingfrom 10⁻⁸ S/cm to 300 S/cm, wherein the copolymer is formed from thepolymer having the structure:

wherein R is selected from the group consisting of alkyl, polyether, andaryl; n is greater than 1; A is selected from the group consisting ofalkyl and aromatic, and FG is a functional group selected from the groupconsisting of primary alkyl amine and primary alcohol.
 32. The copolymerof claim 31, wherein the conductivity ranges from 10⁻⁸ S/cm to 150 S/cm.33. The copolymer of claim 31, wherein the conductivity ranges from 10⁻⁵S/cm to 300 S/cm.
 34. The copolymer of claim 31, wherein theconductivity ranges from 10⁻⁵ S/cm to 150 S/cm.
 35. The copolymer ofclaim 31, wherein the conductivity ranges from 10⁻² S/cm to 150 S/cm.36. The copolymer of claim 31, wherein the conductivity ranges from 1S/cm to 150 S/cm.
 37. The copolymer of claim 31, wherein theconductivity ranges from 5 S/cm to 150 S/cm.
 38. The copolymer of claim31, wherein the conductivity ranges from 10 S/cm to 150 S/cm.
 39. Anintrinsically conductive polythiophene copolymer, the copolymer having aconductivity ranging from 10⁻⁸ S/cm to 300 S/cm, wherein the copolymeris formed from the polymer having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than 1, the polymer being formedfrom a polymerization reaction in major amounts of at least 90% byweight.
 40. The copolymer of claim 39, wherein the conductivity rangesfrom 10⁻⁸ S/cm to 150 S/cm.
 41. The copolymer of claim 39, wherein theconductivity ranges from 10⁻⁵ S/cm to 300 S/cm.
 42. The copolymer ofclaim 39, wherein the conductivity ranges from 10⁻⁵ S/cm to 150 S/cm.43. The copolymer of claim 39, wherein the conductivity ranges from 10⁻²S/cm to 150 S/cm.
 44. The copolymer of claim 39, wherein theconductivity ranges from 1 S/cm to 150 S/cm.
 45. The copolymer of claim39, wherein the conductivity ranges from 5 S/cm to 150 S/cm.
 46. Thecopolymer of claim 39, wherein the conductivity ranges from 10 S/cm to150 S/cm.
 47. An intrinsically conductive polythiophene copolymer, thecopolymer having a conductivity ranging from 10⁻⁸ S/cm to 300 S/cm,wherein the copolymer is formed from the polymer having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than
 1. 48. The copolymer of claim47, wherein the conductivity ranges from 10⁻⁸ S/cm to 150 S/cm.
 49. Thecopolymer of claim 47, wherein the conductivity ranges from 10⁻⁵ S/cm to300 S/cm.
 50. The copolymer of claim 47, wherein the conductivity rangesfrom 10⁻⁵ S/cm to 150 S/cm.
 51. The copolymer of claim 47, wherein theconductivity ranges from 10⁻² S/cm to 150 S/cm.
 52. The copolymer ofclaim 47, wherein the conductivity ranges from 1 S/cm to 150 S/cm. 53.The copolymer of claim 47, wherein the conductivity ranges from 5 S/cmto 150 S/cm.
 54. The copolymer of claim 47, wherein the conductivityranges from 10 S/cm to 150 S/cm.
 55. An intrinsically conductivecopolymer, the copolymer having a conductivity ranging from 10⁻⁸ S/cm to300 S/cm, wherein the copolymer is formed from a poly-(3-substituted)thiophene diol having the structure:

wherein R is a substituent selected from the group consisting of alkyl,polyether, and aryl, and n is greater than
 1. 56. The copolymer of claim55, wherein the conductivity ranges from 10⁻⁸ S/cm to 150 S/cm.
 57. Thecopolymer of claim 55, wherein the conductivity ranges from 10⁻⁵ S/cm to300 S/cm.
 58. The copolymer of claim 55, wherein the conductivity rangesfrom 10⁻⁵ S/cm to 150 S/cm.
 59. The copolymer of claim 55, wherein theconductivity ranges from 10⁻² S/cm to 150 S/cm.
 60. The copolymer ofclaim 55, wherein the conductivity ranges from 1 S/cm to 150 S/cm. 61.The copolymer of claim 55, wherein the conductivity ranges from 5 S/cmto 150 S/cm.
 62. The copolymer of claim 55, wherein the conductivityranges from 10 S/cm to 150 S/cm.